Semiconductor
Advanced Elemental and Isotopic Analysis for Semiconductor Manufacturing and Materials Development
Precision Measurement for Semiconductor Materials Characterisation
Nu Instruments provides high-performance mass spectrometry solutions for trace elemental analysis, isotopic measurements, and materials characterisation throughout semiconductor research, development, and manufacturing workflows.
Semiconductor fabrication requires increasingly sensitive analytical techniques to detect contamination, monitor process consistency, characterise novel materials, and verify product quality. From ultra-trace impurity analysis in high-purity chemicals and wafers to isotopic investigations and thin-film characterisation, advanced mass spectrometry delivers the data needed to support modern semiconductor manufacturing and next-generation device development.
Trace elemental and isotopic analysis with high sensitivity, making it valuable for impurity monitoring and advanced nanomaterial research.
Quantify virtually all elements from 100% to sub-ppb in a single scan, with a dynamic range across 12 orders of magnitude.
Exceptional speed and elemental coverage, analysing nearly the entire periodic table thousands of times per second.
Enables high-precision isotopic measurements and advanced elemental investigations where isotope tracing or material provenance studies are required.
Featured Publications
Trace level analysis of non-metallic elements using the Astrum GD-MS
Measurement of High Purity Metals
GD-MS, HR-ICP-MS
Ultra-Trace Contamination Analysis
Semiconductor yields are highly sensitive to metallic and elemental contamination. Sensitive mass spectrometry techniques help identify impurities in wafers, process chemicals, ultrapure water, and production environments before they impact device performance.
HR-ICP-MS, MC-ICP-MS
Dopant and Process Chemical Characterisation
Precise control of dopant concentrations and process chemistry is essential for maintaining device consistency. Advanced analytical tools enable quantification of trace elements across a wide dynamic range while minimising interference effects.
GD-MS, MC-ICP-MS
Thin Film and Advanced Materials Analysis
As device architectures become more complex, detailed characterisation of deposition materials, coatings, and thin films becomes increasingly important. Direct solid analysis techniques provide insight into elemental composition and material purity.
MC-ICP-MS
Isotopic and Materials Research
Emerging semiconductor technologies often require deeper understanding of material origins, process behaviour, and isotopic signatures. High-precision isotope ratio measurements support advanced research programmes and materials innovation.
