Material Science and Analysis
Advanced Elemental and Isotopic Characterisation for Material Science Research and Quality Control
Reveal Critical Material Properties with High-Performance Mass Spectrometry
Nu Instruments provides a range of ICP-MS and GD-MS technologies designed to support elemental, isotopic, and trace impurity analysis across diverse material science applications.
Material science relies on accurate chemical and isotopic characterisation to understand material performance, optimise manufacturing processes, and ensure product quality. From semiconductor materials and advanced alloys to nanomaterials and high-purity metals, researchers and manufacturers require analytical techniques capable of measuring trace elements, isotopic compositions, and impurity distributions with confidence. Nu Instruments' mass spectrometry portfolio supports these requirements through high sensitivity, precision isotope ratio measurements, and direct solid sample analysis capabilities
Trace elemental and isotopic analysis with high sensitivity, making it valuable for impurity monitoring and advanced nanomaterial research.
Solid-state analytical technique optimised for trace elemental analysis of advanced materials.
Enables high-precision isotopic measurements and advanced elemental investigations where isotope tracing or material provenance studies are required.
Featured Publications
Chemical Purity Determinations of Advanced Alumina Samples
Single particle multielement ICP-MS for lithium battery electrode materials
GD-MS, HR-ICP-MS
High-Purity Materials Characterisation
The development of advanced materials requires the detection and quantification of ultra-trace impurities that can influence performance, reliability, and yield. High-sensitivity mass spectrometry helps researchers verify material purity and identify contamination sources.
GD-MS, HR-ICP-MS, MC-ICP-MS
Metals and Alloy Analysis
Accurate elemental and isotopic characterisation supports alloy development, process optimisation, quality assurance, and failure investigations across industrial and research environments.
HR-ICP-MS, MC-ICP-MS
Semiconductor Materials
Semiconductor manufacturers require extremely low detection limits for contaminant monitoring and process control. Advanced mass spectrometry enables characterisation of semiconductor-grade precursor materials, wafers, and process chemicals.
HR-ICP-MS, MC-ICP-MS
Nanomaterials and Advanced Functional Materials
Emerging materials demand analytical techniques capable of characterising complex compositions, trace impurities, and isotopic variations to support research, innovation, and commercialisation.
